J Romijn | TU Delft Repository

J

J Romijn

Conference paper (2)

Journal article (9)

Report (1)

12 records found

1

Template-induced growth of close-packed and non-close-packed colloidal crystals during solvent evaporation

Journal article (2004) - JP Hoogenboom (author), C Retif (author), E de Bres (author), mv de Boer (author), A.K. van Langen-Suurling (author), J Romijn (author), A van Blaaderen (author)

Epitaxial growth of a colloidal hard-sphere hcp crystal and the effects of epitaxial mismatch on crystal structure

Journal article (2004) - JP Hoogenboom (author), A.K. van Langen-Suurling (author), J Romijn (author), A van Blaaderen (author)

Hard-sphere crystals with hcp and non-close-packed structure grown by colloidal epitaxy

Journal article (2003) - JP Hoogenboom (author), A.K. van Langen-Suurling (author), J Romijn (author), A van Blaaderen (author)

Epitaxial Crystal Growth of Charged Colloids

Journal article (2002) - JP Hoogenboom (author), A Yethiraj (author), A.K. van Langen-Suurling (author), J Romijn (author), A van Blaaderen (author)

Hydrogen SilsesQuioxane, a high-resolution negative tone e-beam resist, investigated for its applicability in photon-based lithographics

Journal article (2002) - M Peuker (author), MH Lim (author), HI Smith (author), R Morton (author), A.K. van Langen-Suurling (author), J Romijn (author), E.W.J.M. van der Drift (author), FCMJM van Delft (author)

HSQ/novolak bilayer resist for high aspect ratio nanoscale e-beam lithography.

Journal article (2000) - FCMJM van Delft (author), JP Weterings (author), A.K. van Langen-Suurling (author), J Romijn (author)

Restructuring of Emma.

Report (2000) - J Romijn (author)

Comparison of negative tone resists NEB22 and UVN30 in e-beam lithography.

Conference paper (1999) - AJ van Dodewaard (author), WSM Ketelaars (author), RFM Roes (author), JAJ Kwinten (author), FCMJM van Delft (author), A.J. van Run (author), J Romijn (author), A.K. van Langen-Suurling (author)

A compact PHASAR with low central channel loss

Conference paper (1999) - YC Zhu (author), FH Groen (author), DHP Maat (author), YS Oei (author), J Romijn (author), I Moerman (author)

Fabrication and analysis of Exteme Ultra-violet reflection masks with patterned W/C absorber bilayers

Journal article (1997) - HJ Voorma (author), E Louis (author), J Friedrich (author), NB Koster (author), LA Smaenok (author), F Bijkerk (author), T Zijlstra (author), LEM de Groot (author), E.W.J.M. van der Drift (author), BAC Rousseeuw (author), J Romijn (author)

Extreme UV Lithography: Development of a laser plasma source and multilayer reflective optics

Journal article (1996) - F Bijkerk (author), LA Shmaenol (author), T Zijlstra (author), E Louis (author), HJ Voorma (author), NB Koster (author), FA van Goor (author), J van Spijker (author), E.W.J.M. van der Drift (author), J Romijn (author), BAC Rousseeuw (author)

DUV-E-beam Mix and Match lithography in a single mask for fabricating a multi-terminal SQUID-device

Journal article (1996) - BJ Vleeming (author), JTLR Leene (author), E.W.J.M. van der Drift (author), J Romijn (author)