HSQ/novolak bilayer resist for high aspect ratio nanoscale e-beam lithography.

Journal article (2000)

Authors

FCMJM van Delft External organisation
JP Weterings External organisation
A.K. van Langen-Suurling QN/Kavli Nanolab Delft - AS
J Romijn QN/Kavli Nanolab Delft - AS
Research Group
QN/Kavli Nanolab Delft (AS) (TU Delft)
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Published Date

2000

Language

Undefined/Unknown

Reuse Rights

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Faculty

Applied Sciences

Department

QN/Quantum Nanoscience

Research Group

QN/Kavli Nanolab Delft