FCMJM van Delft | TU Delft Repository

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FCMJM van Delft

Conference paper (1)

Journal article (3)

4 records found

1

Hydrogen SilsesQuioxane, a high-resolution negative tone e-beam resist, investigated for its applicability in photon-based lithographics

Journal article (2002) - M Peuker (author), MH Lim (author), HI Smith (author), R Morton (author), A.K. van Langen-Suurling (author), J Romijn (author), E.W.J.M. van der Drift (author), FCMJM van Delft (author)

Comparison of negative tone resists NEB22 and UVN30 in e-beam lithography.

Journal article (2000) - AJ van Dodewaard (author), WSM Ketelaars (author), RFM Roes (author), JAJ Kwinten (author), FCMJM van Delft (author), A.J. van Run (author), A.K. van Langen-Suurling (author)

HSQ/novolak bilayer resist for high aspect ratio nanoscale e-beam lithography.

Journal article (2000) - FCMJM van Delft (author), JP Weterings (author), A.K. van Langen-Suurling (author), J Romijn (author)

Comparison of negative tone resists NEB22 and UVN30 in e-beam lithography.

Conference paper (1999) - AJ van Dodewaard (author), WSM Ketelaars (author), RFM Roes (author), JAJ Kwinten (author), FCMJM van Delft (author), A.J. van Run (author), J Romijn (author), A.K. van Langen-Suurling (author)