AJ van Dodewaard | TU Delft Repository

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AJ van Dodewaard

Conference paper (1)

Journal article (1)

2 records found

1

Comparison of negative tone resists NEB22 and UVN30 in e-beam lithography.

Journal article (2000) - AJ van Dodewaard (author), WSM Ketelaars (author), RFM Roes (author), JAJ Kwinten (author), FCMJM van Delft (author), A.J. van Run (author), A.K. van Langen-Suurling (author)

Comparison of negative tone resists NEB22 and UVN30 in e-beam lithography.

Conference paper (1999) - AJ van Dodewaard (author), WSM Ketelaars (author), RFM Roes (author), JAJ Kwinten (author), FCMJM van Delft (author), A.J. van Run (author), J Romijn (author), A.K. van Langen-Suurling (author)