Comparison of negative tone resists NEB22 and UVN30 in e-beam lithography.

Conference paper (1999)

Authors

AJ van Dodewaard External organisation
WSM Ketelaars External organisation
RFM Roes External organisation
JAJ Kwinten External organisation
FCMJM van Delft External organisation
A.J. van Run QN/Kavli Nanolab Delft - AS
J Romijn QN/Kavli Nanolab Delft - AS
A.K. van Langen-Suurling QN/Kavli Nanolab Delft - AS
Research Group
QN/Kavli Nanolab Delft (AS) (TU Delft)
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Published Date

1999

Language

Undefined/Unknown

Reuse Rights

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Faculty

Applied Sciences

Department

QN/Quantum Nanoscience

Research Group

QN/Kavli Nanolab Delft