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RFM Roes
Academic Work (2)
Conference paper (1)
Journal article (1)
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2 records found
1
Comparison of negative tone resists NEB22 and UVN30 in e-beam lithography.
Journal article (2000) -
AJ van Dodewaard (author)
,
WSM Ketelaars (author)
,
RFM Roes (author)
,
JAJ Kwinten (author)
,
FCMJM van Delft (author)
,
A.J. van Run (author)
,
A.K. van Langen-Suurling (author)
Comparison of negative tone resists NEB22 and UVN30 in e-beam lithography.
Conference paper (1999) -
AJ van Dodewaard (author)
,
WSM Ketelaars (author)
,
RFM Roes (author)
,
JAJ Kwinten (author)
,
FCMJM van Delft (author)
,
A.J. van Run (author)
,
J Romijn (author)
,
A.K. van Langen-Suurling (author)
