Hydrogen SilsesQuioxane, a high-resolution negative tone e-beam resist, investigated for its applicability in photon-based lithographics

Journal article (2002)

Authors

M Peuker External organisation
MH Lim External organisation
HI Smith External organisation
R Morton External organisation
A.K. van Langen-Suurling QN/Kavli Nanolab Delft - AS
J Romijn QN/Kavli Nanolab Delft - AS
E.W.J.M. van der Drift QN/Kavli Nanolab Delft - AS
FCMJM van Delft External organisation
Research Group
QN/Kavli Nanolab Delft (AS) (TU Delft)
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Published Date

2002

Language

Undefined/Unknown

Reuse Rights

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Faculty

Applied Sciences

Department

QN/Quantum Nanoscience

Research Group

QN/Kavli Nanolab Delft