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JP Weterings
Academic Work (1)
Journal article (1)
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HSQ/novolak bilayer resist for high aspect ratio nanoscale e-beam lithography.
Journal article (2000) -
FCMJM van Delft (author)
,
JP Weterings (author)
,
A.K. van Langen-Suurling (author)
,
J Romijn (author)
