JP Weterings | TU Delft Repository

JW

JP Weterings

Journal article (1)

1 records found

1

HSQ/novolak bilayer resist for high aspect ratio nanoscale e-beam lithography.

Journal article (2000) - FCMJM van Delft (author), JP Weterings (author), A.K. van Langen-Suurling (author), A. K. Van Langen-Suurling (author), A. K. van Langen-Suurling (author), A.K. Van Langen-Suurling (author), J Romijn (author)