DUV-E-beam Mix and Match lithography in a single mask for fabricating a multi-terminal SQUID-device

Journal article (1996)

Authors

BJ Vleeming External organisation
JTLR Leene External organisation
E.W.J.M. van der Drift QN/Kavli Nanolab Delft - AS
J Romijn QN/Kavli Nanolab Delft - AS
Research Group
QN/Kavli Nanolab Delft (AS) (TU Delft)
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Published Date

1996

Language

Undefined/Unknown

Reuse Rights

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Faculty

Applied Sciences

Department

QN/Quantum Nanoscience

Research Group

QN/Kavli Nanolab Delft