DUV-E-beam Mix and Match lithography in a single mask for fabricating a multi-terminal SQUID-device

Journal article (1996)

Authors

BJ Vleeming External organisation
JTLR Leene External organisation
E.W.J.M. van der Drift QN/Kavli Nanolab Delft
J Romijn QN/Kavli Nanolab Delft
Research Group
QN/Kavli Nanolab Delft
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Published Date

1996

Language

Undefined/Unknown

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Research Group

QN/Kavli Nanolab Delft