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JTLR Leene
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DUV-E-beam Mix and Match lithography in a single mask for fabricating a multi-terminal SQUID-device
Journal article (1996) -
BJ Vleeming (author)
,
JTLR Leene (author)
,
E.W.J.M. van der Drift (author)
,
J Romijn (author)
