Library
search
Press enter to search in title/abstract
in title/abstract
in authors
local_library
Repository
M
MSP Andriesse
12 records found
1
Authored
Comparative study of Cl-2, Cl-2/O-2, and Cl-2/N-2 inductively coupled plasma processes for etching of high-aspect-ratio photonic-crystal holes in InP
Journal article (2008) -
CF Carlstrom
,
R van der Heijden
,
MSP Andriesse
,
F Karouta
,
RW van der Heijden
,
E.W.J.M. van der Drift
,
H.W.M. Salemink
Magnetization losses in submicrometer CoFeB dots etched in a high ion density Cl2-based plasma
Journal article (2006) -
C.G.C.H.M Fabrie
,
JT Kohlhepp
,
HJM Swagten
,
B Koopmans
,
MSP Andriesse
Cl2-based inductively coupled plasma etching of photonic crystals in InP,
Conference paper (2004) -
RW van der Heijden
,
CF Carlström
,
MSP Andriesse
,
E.W.J.M. van der Drift
,
EJ Geluk
,
F Karouta
,
P Nouwens
,
YS Oei
,
T de Vries
,
H.W.M. Salemink
Deep dry etching process development for photonic crystals in InP-based planar waveguides
Conference paper (2004) -
RW van der Heijden
,
MSP Andriesse
,
CF Carlström
,
E.W.J.M. van der Drift
,
EJ Geluk
,
F Karouta
,
P Nouwens
,
YS Oei
,
T de Vries
,
H.W.M. Salemink
Advanded dry etching for next generation thin film heads for mangentic recording.
Report (2001) -
MSP Andriesse
,
E.W.J.M. van der Drift
Advanded dry etching for next generation thin film heads for mangentic recording.
Report (2001) -
MSP Andriesse
,
E.W.J.M. van der Drift
High speed, dry etching of Fe for integration of magnetic devices in microelectronics.
Journal article (2001) -
MSP Andriesse
,
E.W.J.M. van der Drift
,
W.G. Sloof
High speed anisotropic dry etching of CoNbZr for next generation magnetic recording.
Conference paper (2000) -
MSP Andriesse
,
T Zijlstra
,
E.W.J.M. van der Drift
High Speed anisotropic dry etching of CoNbZr for next generation magnetic recording.
Journal article (2000) -
MSP Andriesse
,
T Zijlstra
,
E.W.J.M. van der Drift
High Speed anisotropic dry etching of CoNbZr for next generation magnetic recording.
Report (2000) -
MSP Andriesse
,
T Zijlstra
,
E.W.J.M. van der Drift
Advanced dry etching for next generation thin film heads for magnetic recording.
Report (1999) -
MSP Andriesse
,
E.W.J.M. van der Drift
Plasma induced charging damage of gate oxides.
Conference paper (1999) -
RG van Veen
,
A.H. Verbruggen
,
F Kuper
,
MSP Andriesse
,
E.W.J.M. van der Drift
,
S Radelaar
,
S Anders
,
HM Jaeger
,
Z Wang
,
P Tanner
,
C Salm
,
T Mouthaan