MSP Andriesse | TU Delft Repository

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MSP Andriesse

Conference paper (4)

Journal article (4)

Report (4)

12 records found

1

Comparative study of Cl-2, Cl-2/O-2, and Cl-2/N-2 inductively coupled plasma processes for etching of high-aspect-ratio photonic-crystal holes in InP

Journal article (2008) - CF Carlstrom (author), R van der Heijden (author), MSP Andriesse (author), F Karouta (author), RW van der Heijden (author), E.W.J.M. van der Drift (author), H.W.M. Salemink (author)

Magnetization losses in submicrometer CoFeB dots etched in a high ion density Cl2-based plasma

Journal article (2006) - C.G.C.H.M Fabrie (author), JT Kohlhepp (author), HJM Swagten (author), B Koopmans (author), MSP Andriesse (author)

Cl2-based inductively coupled plasma etching of photonic crystals in InP,

Conference paper (2004) - RW van der Heijden (author), CF Carlström (author), MSP Andriesse (author), E.W.J.M. van der Drift (author), EJ Geluk (author), F Karouta (author), P Nouwens (author), YS Oei (author), T de Vries (author), H.W.M. Salemink (author)

Deep dry etching process development for photonic crystals in InP-based planar waveguides

Conference paper (2004) - RW van der Heijden (author), MSP Andriesse (author), CF Carlström (author), E.W.J.M. van der Drift (author), EJ Geluk (author), F Karouta (author), P Nouwens (author), YS Oei (author), T de Vries (author), H.W.M. Salemink (author)

Advanded dry etching for next generation thin film heads for mangentic recording.

Report (2001) - MSP Andriesse (author), E.W.J.M. van der Drift (author)

High speed, dry etching of Fe for integration of magnetic devices in microelectronics.

Journal article (2001) - MSP Andriesse (author), E.W.J.M. van der Drift (author), W.G. Sloof (author)

Advanded dry etching for next generation thin film heads for mangentic recording.

Report (2001) - MSP Andriesse (author), E.W.J.M. van der Drift (author)

High Speed anisotropic dry etching of CoNbZr for next generation magnetic recording.

Report (2000) - MSP Andriesse (author), T Zijlstra (author), E.W.J.M. van der Drift (author)

High Speed anisotropic dry etching of CoNbZr for next generation magnetic recording.

Journal article (2000) - MSP Andriesse (author), T Zijlstra (author), E.W.J.M. van der Drift (author)

High speed anisotropic dry etching of CoNbZr for next generation magnetic recording.

Conference paper (2000) - MSP Andriesse (author), T Zijlstra (author), E.W.J.M. van der Drift (author)

Plasma induced charging damage of gate oxides.

Conference paper (1999) - RG van Veen (author), A.H. Verbruggen (author), F Kuper (author), MSP Andriesse (author), E.W.J.M. van der Drift (author), S Radelaar (author), S Anders (author), HM Jaeger (author), Z Wang (author), P Tanner (author), C Salm (author), T Mouthaan (author)

Advanced dry etching for next generation thin film heads for magnetic recording.

Report (1999) - MSP Andriesse (author), E.W.J.M. van der Drift (author)