Comparative study of Cl-2, Cl-2/O-2, and Cl-2/N-2 inductively coupled plasma processes for etching of high-aspect-ratio photonic-crystal holes in InP

Journal article (2008)

Authors

CF Carlstrom External organisation
R van der Heijden External organisation
MSP Andriesse QN/Kavli Nanolab Delft - AS
F Karouta External organisation
RW van der Heijden External organisation
E.W.J.M. van der Drift QN/Kavli Nanolab Delft - AS
H.W.M. Salemink QN/Photronic Devices
Research Group
QN/Kavli Nanolab Delft (AS) (TU Delft)
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Published Date

2008

Language

Undefined/Unknown

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Faculty

Applied Sciences

Department

QN/Quantum Nanoscience

Research Group

QN/Kavli Nanolab Delft