Comparative study of Cl-2, Cl-2/O-2, and Cl-2/N-2 inductively coupled plasma processes for etching of high-aspect-ratio photonic-crystal holes in InP

Journal article (2008)

Authors

CF Carlstrom External organisation
R van der Heijden External organisation
MSP Andriesse QN/Kavli Nanolab Delft
F Karouta External organisation
RW van der Heijden External organisation
EWJM van der Drift QN/Kavli Nanolab Delft
H.W.M. Salemink QN/Photronic Devices
Research Group
QN/Kavli Nanolab Delft
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Published Date

2008

Language

Undefined/Unknown

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Research Group

QN/Kavli Nanolab Delft

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