Cl2-based inductively coupled plasma etching of photonic crystals in InP,

van der Heijden, RW; Carlström, CF; Andriesse, MSP; van der Drift, E.W.J.M.; Geluk, EJ; Karouta, F; Nouwens, P; Oei, YS; de Vries, T; Salemink, H.W.M.

Cl2-based inductively coupled plasma etching of photonic crystals in InP,

Conference paper (2004)

Authors

RW van der Heijden External organisation

CF Carlström External organisation

MSP Andriesse QN/Kavli Nanolab Delft -

E.W.J.M. van der Drift QN/Kavli Nanolab Delft -

EJ Geluk Electronic Components, Technology and Materials -

F Karouta External organisation

P Nouwens External organisation

YS Oei External organisation

T de Vries External organisation

H.W.M. Salemink QN/Fysics of NanoElectronics

Research Group

QN/Kavli Nanolab Delft () (TU Delft)

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Published Date

2004

Language

Undefined/Unknown

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Faculty

Applied Sciences

Department

QN/Quantum Nanoscience

Research Group

QN/Kavli Nanolab Delft