As electronics and software become more integrated into automobiles, Functional Safety (FuSa) per ISO 26262 becomes important. It assesses the risk level of automotive chips, reflected by the Automotive Safety Integrity Level (ASIL). Fault injection simulation verifies the FuSa of a design by injecting faults and classifying them based on whether safety mechanisms detect them. Discrepancies in classification results from FuSa EDA tools can lead to varying ASIL assignments and misrepresent associated risk. Thus, we evaluate two FuSa EDA tools, Cadence® XFS and Synopsys® VC Z01X, for RTL designs. We find that the fault space covered by the tools is not complete. Hence, we propose a novel verification methodology combining both tools to achieve maximum fault space coverage. We apply this approach to the AutoSoC benchmark suite and achieve a more accurate Diagnostic Coverage (DC) of 97.79%, over the baseline verification methodology of 98.36%, at the cost of injecting 1.31 times more faults. Our work ensures that the correct ASIL level is assigned through accurate DC estimation.

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Traditional charge-based memories such as dynamic RAM (DRAM) and flash are facing more and more manufacturing, reliability, energy, and speed issues. A growing group of emerging memory technologies, such resistive RAM (RRAM), spin-transfer torque magnetic RAM (STT-MRAM), phase change memory (PCM), and Ferroelectric (Fe) devices (e.g., FeFET, FeRAM), address these problems. Nonetheless, these technologies are also not perfect, and thus special care must be taken to ensure that the lifecycle management, from design to obsolescence, of these memories is as optimal as possible. Lifecycle management is being developed for traditional technologies, but these are not optimized for emerging memories yet. In this paper, we present the first steps of lifecycle management for emerging memories. We analyze the different lifecycle phases that exist for two case studies on RRAM and FeFET-based memories. In this analysis, we identify how the phases affect each other and which optimizations are possible by analyzing the complete lifecycle. Finally, we compare the lifecycle phases of these two emerging memories to see how a unified approach can be developed.

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Resistive Random-Access Memories (ReRAMs) represent a promising candidate to complement and/or replace CMOS-based memories used in several emerging applications. Despite all the advantages of using these novel memories, mainly due to the memristive device's CMOS manufacturing process compatibility, zero standby power consumption, as well as, high scalability and density, the use of them in real applications depends on being able to guarantee their quality after manufacturing. As observed in CMOS-based memories, ReRAMs are also susceptible to manufacturing deviations, defects, and process variations, that can cause faulty behaviors different from the ones observed in CMOS technology, increasing not only the manufacturing test complexity but also the time required to perform the test. In this context, this paper proposes to study the use of temperature to facilitate fault propagation in ReRAMs, reducing the required test time. A case study composed of a 3x3 word-based ReRAM with peripheral circuitry implemented based on a 130 nm Predictive Technology Model (PTM) library was adopted. During the proposed study, a total of 17 defects were injected in different positions of the ReRAM cell, and their respective faulty behavior was classified into traditional and unique faults, considering three temperatures (25, 100, and -40°C). The obtained results show that the temperature can, depending on the position of the defect, facilitate fault propagation, which reduces the time required for performing manufacturing testing.

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Resistive Random Access Memories (RRAMs) are now undergoing commercialization, with substantial investment from many semiconductor companies. However, due to the immature manufacturing process, RRAMs are prone to exhibit unique defects, which should be efficiently identified for high-volume production. Hence, obtaining diagnostic solutions for RRAMs is necessary to facilitate yield learning, and improve RRAM quality. Recently, the Device-Aware Test (DAT) approach has been proposed as an effective method to detect unique defects in RRAMs. However, the DAT focuses more on developing defect models to aid production testing but does not focus on the distinctive features of defects to diagnose different defects. This paper proposes a Device-Aware Diagnosis method; it is based on the DAT approach, which is extended for diagnosis. The method aims to efficiently distinguish unique defects and conventional defects based on their features. To achieve this, we first define distinctive features of each defect based on physical analysis and characterizations. Then, we develop efficient diagnosis algorithms to extract electrical features and fault signatures for them. The simulation results show the effectiveness of the developed method to reliably diagnose all targeted defects.

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The Spin-Transfer Torque Magnetic Random Access Memory (STT-MRAM) is on its way to commercialization. However, the development of high-quality test solutions for STT-MRAMs poses challenges due to the specific working mechanism of the core element of the STT-MRAM bit cells, i.e., the magnetic tunnel junction (MTJ), which involves both a magnetic field and spin-transfer torque. This property can introduce defects unique to MTJs which may escape from test programs that consist solely of functional write and read operations, like march tests. Hence, it is important to develop test solutions that go beyond conventional march tests. This paper explores the effect of applying an external magnetic field (H_ext) on the test quality and test time of STT-MRAMs, which could be achieved by integrating one or more magnets in the Automated Test Equipment (ATE) setup. A framework for these so-called H_ext-assisted tests is presented and implemented for all known conventional and unique defects. The paper demonstrates that the H_ext-assisted tests offer superior coverage and/or lower test time compared to regular functional tests, like march tests. The effectiveness of these tests are validated through silicon measurements.

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As emerging non-volatile memory (NVM) devices, Ferroelectric Field-Effect Transistors (FeFETs) present distinctive opportunities for the design of ultra-dense and low-leakage memory systems. For matured FeFET manufacturing, it is extremely important to have an understanding of manufacturing defects and accurately model them to develop effective test solutions. This paper introduces a comprehensive framework for defect and fault modeling, which enables the development of test solutions. First, a classification of FeFET manufacturing defects is provided; both conventional defects (such as contacts and interconnect defects) as well as unique FeFET defects are discussed. The latter FeFET specific defect leads to unique faults that cannot be adequately described using traditional modeling approaches. Then, the Device-Aware Test (DAT) method is used to effectively and appropriately model, analyze and develop test solutions for such unique defects; the approach will be illustrated for Stuck-at-Polarization (SAP) defects.

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Memristive devices have become promising candidates to complement the CMOS technology, due to their CMOS manufacturing process compatibility, zero standby power consumption, high scalability, as well as their capability to implement high-density memories and new computing paradigms. Despite these advantages, memristive devices are susceptible to manufacturing defects that may cause faulty behaviors not observed in CMOS technology, significantly increasing the challenge of testing these novel devices after manufacturing. This work proposes an optimized Design-for-Testability (DfT) strategy based on the introduction of a DfT circuitry that measures the current consumption of Resistive Random Access Memory (ReRAM) cells to detect not only traditional but also unique faults. The new DfT circuitry was validated using a case study composed of a 3x3 word-based ReRAM with peripheral circuitry implemented based on a 130 nm Predictive Technology Model (PTM) library. The obtained results demonstrate the fault detection capability of the proposed strategy with respect to traditional and unique faults. In addition, this paper evaluates the impact related to the DfT circuitry’s introduced overheads as well as the impact of process variation on the resolution of the proposed DfT circuitry.

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Due to the immature manufacturing process, Resistive Random Access Memories (RRAMs) are prone to exhibit new failure mechanisms and faults, which should be efficiently detected for high-volume production. Those unique faults are hard to detect but require specific Design-for-Test (DfT) circuit design. This paper proposes a DfT based on a parallel-reference write circuit that can detect all RRAM array faults during diagnosis, production testing, and its application in the field.@en

Guaranteeing high-quality test solutions for Spin-Transfer Torque Magnetic RAM (STT-MRAM) is a must to speed up its high-volume production. A high test quality requires maximizing the fault coverage. Detecting permanent faults is relatively simple compared to intermittent faults; the latter are faults (caused by non-environmental conditions) that appear and disappear as a function of time, and are therefore hard to detect. Testing for such faults in STT-MRAMs is even worse considering the Magnetic Tunneling Junction inherent property ‘intrinsic switching stochasticity’, which results in inevitable random write errors. This paper presents a novel Design-for-Testability (DFT) scheme for detecting intermittent faults in STT-MRAMs; it is based on monitoring the write current. The strength of the write current is inversely correlated to the write error rate; when the write current is smaller than the specification, the device is considered faulty. A reduction in the write current can be caused by any defect in the write path of the memory (e.g., interconnects and contacts). Simulation results based on industrial design show that applying DFT yields a superior coverage of intermittent faults compared to functional test methods, such as march tests.@en

Resistive Random Access Memories (RRAMs) are now undergoing commercialization, with substantial investment from many semiconductor companies. However, due to the immature manufacturing process, RRAMs are prone to exhibit new failure mechanisms and faults, which should be efficiently detected for high-volume production. Some of those faults are hard-to-detect, and require specific Design-for-Testability (DfT) circuit design. This paper proposes a DfT based on a parallel-reference write circuit that can detect all single-cell RRAM array faults: strong faults (directly causing logic errors) as well as weak faults (caused by parametric deviations). The scheme replaces the regular write driver, and enables the monitoring and comparison of the write current against multiple references during a single write operation. Hence, it serves as a DfT scheme and as a normal write circuit simultaneously. In addition, it enhances production testing speed and online fault detection, while keeping the area overhead low. Furthermore, the DfT is configurable for efficient diagnosis and yield learning. The results of the simulations performed do not only show that the DfT can detect single-cell conventional faults (due to interconnects and contacts) as well as unique RRAM faults (based on silicon data) that have been demonstrated to exist, but also that the DfT is robust to process variations.@en

While Resistive RRAM (RRAM) offers attractive features for artificial neural networks (NN) such as low power operation and high-density, its conductance variation can pose significant challenges when the storage of synaptic weights is concerned. This paper reports an experimental evaluation of the conductance variations of manufactured RRAMs at the memory array level. Working at the memory array level allows to catch cycle-to-cycle (C2C) as well as device-to-device (D2D) variability and, hence, to propose a realistic evaluation of the conductance variation. Variability is evaluated with respect to the RRAM low resistance state (LRS) and high resistance state (HRS) conductance ratio. This ratio is selected as the parameter of interest as it guarantees the proper operation of the RRAM: the larger the ratio, the more reliable and robust the RRAM cell is in storing and retrieving data. The measurement results show that the conductance ratio is heavily affected by variability. Large spatial and temporal variations are reported, making challenging RRAM-based analog weight storage.

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Spin-Transfer Torque Magnetic RAMs (STT-MRAMs) are on their way to commercialization. However, obtaining high-quality test and diagnosis solutions for STT-MRAMs is challenging due to the existence of unique defects in Magnetic Tunneling Junctions (MTJs). Recently, the Device-Aware Test (DA-Test) method has been put forward as an effective approach mainly for detecting unique defecting STT-MRAMs. In this study, we propose a further advancement based on the DA-Test framework, introducing the Device-Aware Diagnosis (DA-Diagnosis) method. This method comprises two steps: a) defining distinctive features of each unique defect by characterization and physical analysis of defective MTJs, and b) utilizing march algorithms to extract distinctive features. The effectiveness of the proposed approach is validated in an industrial setting with real devices and data measurement.

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Resistive Random Access Memory (RRAM) is a potential technology to replace conventional memories by providing low power consumption and high-density storage. As various manufacturing vendors make significant efforts to push it to high-volume production and commercialization, high-quality and efficient test solutions are of great importance. This paper analyzes interconnect and contact defects in RRAMs, while considering the impact of the memory Data Background (DB), and proposes test solutions. The complete interconnect and contact defect space in a layout-independent RRAM design is defined. Exhaustive defect injection and circuit simulation are performed in a systematic manner to derive appropriate fault models, not only for single-cell and two-cell coupling faults, but also for multi-cell coupling faults where the DBs are important. The results show the existence of unique 3-cell and 4-cell coupling faults due to e.g., the sneak path in the array induced by defects. These unique faults cannot be detected with traditional RRAM test solutions. Therefore, the paper introduces a test generation method that takes into account the DB, which is able to efficiently detect all these faults; hence, further improving the fault/defect coverage in RRAMs.@en

Many companies are heavily investing in the commercialization of Resistive Random Access Memories (RRAMs). This calls for a comprehensive understanding of manufacturing defects to develop efficient and high-quality test and diagnosis solutions to push high-volume production. This paper identifies and characterizes a new defect based on silicon measurements; the defect is called Ion Depletion (ID). In our case study, 45% cycles suffered from an intermittent reduction in high resistance state and did not impact low resistance state. The paper shows that the traditional fault modeling based on linear resistors as a defect model is not accurate. To address this challenge, the Device-Aware (DA) defect modeling method is applied; an RRAM model of the defective device is developed and calibrated using measurements to accurately describe the impact of the defect on the electrical behavior of the memory device. Afterward, fault analysis is performed based on the DA defect model, and appropriate fault models are introduced; they show that the ID defect may sensitize undefined state faults. Finally, dedicated test and diagnosis solutions for the ID defect are proposed.@en

Resistive Random Access Memory (RRAM, or ReRAM) is a promising memory technology to replace Flash because of its low power consumption, high storage density, and simple integration in existing IC production processes. This has motivated many companies to invest in this technology. However, RRAM manufacturing introduces new failure mechanisms and faults that cause functional errors. These faults cannot all be detected by state-of-the-art test and diagnosis solutions, thus leading to slower product development and low-quality products. This paper introduces a design-for-test (DFT) based on a parallel-multi-reference read (PMRR) circuit that can detect all RRAM array faults. The PMRR circuit replaces the standard sense amplifier and compares the cell’s state to multiple references during one read operation. Thus, it can be used as a DFT scheme and a normal read circuit at once. This allows for speeding up production testing and the online detection of faults. Furthermore, the circuit is extendable so that more references can be compared, which is required for efficient diagnosis. Finally, the references can be adjusted to maximize the production yield. The circuit outperforms state-of-the-art solutions because it can detect all RRAM faults during diagnosis, production testing, and during its application in the field while minimizing yield loss.@en

The development of Spin-transfer torque magnetic RAM (STT-MRAM) mass production requires high-quality dedicated test solutions, for which understanding and modeling of manufacturing defects of the magnetic tunnel junction (MTJ) is crucial. This paper introduces and characterizes a new defect called Back-Hopping (BH); it also provides its fault models and test solutions. The BH defect causes MTJ state to oscillate during write operations, leading to write failures. The characterization of the defect is carried out based on manufactured MTJ devices. Due to the observed non-linear characteristics, the BH defect cannot be modelled with a linear resistance. Hence, device-aware defect modeling is applied by considering the intrinsic physical mechanisms; the model is then calibrated based on measurement data. Thereafter, the fault modeling and analysis is performed based on circuit-level simulations; new fault primitives/models are derived. These accurately describe the way the STT-MRAM behaves in the presence of BH defect. Finally, dedicated march test and a Design-for-Test solutions are proposed.

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Resistive Random Access Memories (RRAMs) are being commercialized with significant investment from several semiconductor companies. In order to provide efficient and high-quality test solutions to push high-volume production, a comprehensive understanding of manufacturing defects is significantly required. This paper identifies and characterizes the over-RESET phenomenon based on silicon measurements. In our case study, 30% cycles suffered from intermittent extremely high resistance state exceeding the high resistance state criteria. The paper shows the limitations of conventional defect modeling based on linear resistors. To address this challenge, the Device-Aware (DA) defect modeling method is applied; a model of the defective RRAM device is developed and calibrated using measurements to accurately describe the impact of the defect on the electrical behavior of the memory device. Afterward, fault analysis is performed based on the DA defect model, and appropriate fault models are introduced; they show that the DA defect model will sensitize deep (extremely high resistance) state faults. Finally, dedicated test solutions for over-RESET devices are proposed.@en

The development of Spin-Transfer Torque Magnetic RAMs (STT-MRAMs) mass production requires high-quality test solutions. Accurate and appropriate fault modeling is crucial for the realization of such solutions. This paper targets fault modeling and test generation for all interconnect and contact defects in STT-MRAMs and shows that using the defect injection and circuit simulation for fault modeling without incorporating the impact of magnetic coupling will result in an incomplete set of fault models; hence, not obtaining accurate fault models. Magnetic coupling introduced by the stray field is an inherent property of STT-MRAMs and may foster the occurrence of additional memory faults. Not considering the magnetic coupling clearly will give rise to test escapes. The paper introduces a compact model for STT-MRAM that incorporates the intra- and inter-cell stray field, uses this model to derive the full set of fault models for interconnect and contact defects, and finally proposes an efficient test solution.

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This paper addresses one of the directions of the HORIZON EU CONVOLVE project being dependability of smart edge processors based on computation-in-memory and emerging memristor devices such as RRAM. It discusses how how this alternative computing paradigm will change the way we used to do manufacturing test. In addition, it describes how these emerging devices inherently suffering from many non-idealities are calling for new solutions in order to ensure accurate and reliable edge computing. Moreover, the paper also covers the security aspects for future edge processors and shows the challenges and the future directions.@en

Resistive RAM (RRAM) is a promising technology to replace traditional technologies such as Flash, because of its low energy consumption, CMOS compatibility, and high density. Many companies are prototyping this technology to validate its potential. Bringing this technology to the market requires high-quality tests to ensure customer satisfaction. Hence, it is of great importance to deeply understand manufacturing defects and accurately model them to develop optimal tests. This paper presents a holistic framework for defect and fault modeling that enables the development of optimal tests for RRAMs. An overview and classification of RRAM manufacturing defects are provided. Defects in contacts and interconnects are modeled as resistors. Unique RRAM defects, e.g., forming defects, require Device-Aware defect modeling which incorporates the defect's impact on the device's electric properties by adjusting the affected technology and electrical parameters. Additionally, a systematic approach to define the fault space is presented, followed by a methodology to validate this space. With this methodology, accurate fault modeling for contact, interconnect, and forming defects is performed and tests are developed. The tests are able to detect all faults in a time-efficient manner, thereby proving the effectiveness of the framework. Finally, an outlook on future RRAM testing is presented.

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