Zernike representation and Strehl ratio op optical systems with variable numerical aperture.

Analytic expressions and approximations for the on-axis, aberration-free Rayleigh and Debye intergral in the case of focusing fields on a circular aperture.

Assessment of optical systems by means of point-spread functions.

Extended Nijboer-Zernike (ENZ) based evaluation of amplitude and phase aberrations on scaled and annual pupils.

Strehl ratio and optimum focus of high-numerical-aperture beams.

High-NA aberration retrieval with extended Nijboer-Zernike vector diffraction theory: Erratum

Energy and angular momentum flux in a high-numerical-aperture imaging system using the extended Nijboer-Zernike theory.

Estimating resist parameters in optical lithograpgy using the extended Nijboer-Zernike theory

High-NA aberration retrieval with the extended Nijboer-Zernike vector diffraction theory.

Aerial image based lens metrology for wafer steppers.

High-NA lens characterization by through-focus intensity measurement

Aberration retrieval for high-NA optical systems using the extended Nijboer-Zernike theory

Through-Focus Point-Spread Function Evaluation fro Lens Metrology using the extended Nijboer-Zernike Theory

Abberation retrieval from the intensity points-spread function in the focal region using the extended

Extended Nijboer-Zernike approach to aberration and birefringence retrieval in a high-numerical-aperture optical system

Influence of mask induced polarization effects on a pattern printability

Polarisation-aberration retrieval for high-NA systems using the extended Nijboer-Zernike diffraction theory.

On the computation of the Nijboer-Zernike aberration intergrals at arbitrary defocus

Determination of resist parameters using the extended Nijboer-Zernike theory.

Aberration retrieval using the extended Nijboer-Zernike approach