AN

A.M. Nugrowati

14 records found

Authored

Significant role of phase mask structures in extreme ultraviolet lithopgraphy to achieve near-wavelength resolution. IN PRESS
Journal article (2009) - A.M. Nugrowati, S.F. Pereira, J.J.M. Braat

Erratum: Interference or not: Analysis of the young's experiment for a single-cycle pulse
Journal article (2008) - S.F. Pereira, A.M. Nugrowati

Polarisation-sensitive ultrashort pulse shaping by narrow metal slits

Combining various optical simulations tools to enable complex optical systems simulations.

Vectorial Diffrection of Extreme Ultraviolet Light and Ultrashort Light Pulses.
Doctoral thesis (2008) - A.M. Nugrowati

Studying light Diffraction at A Small Scale: applications and theories.
Poster (2008) - A.M. Nugrowati

Studying light Diffraction at A Small Scale: applications and theories.
Poster (2008) - A.M. Nugrowati

Near field intermediate fields of an ultrashort pulse transmitted through Young's double-slit experiment.
Journal article (2008) - A.M. Nugrowati, S.F. Pereira, A.S. van de Nes

Studying light Diffraction at A Small Scale: applications and theories.
Poster (2008) - A.M. Nugrowati

Numerical analysis of aslit-groove diffrection problem

Rigorous calculation of the time evolution of an ultrashort pulse through slit structures in the near and intermediate zones.

Resolution enhancement in extreme ultraviolet lithography: the imaging of a 2-D reflecting phase shifting mask with conical illumination.

EUV phase mask engineering based on image optimisation.

Enhanced imaging in Extreme UV lithography by optimising the Molybdenum/Silicon thickness ratio in 2-D phase shifting mask design.