Significant role of phase mask structures in extreme ultraviolet lithopgraphy to achieve near-wavelength resolution. IN PRESS

Journal article (2009)

Authors

A.M. Nugrowati ImPhys/Optics
SF Pereira ImPhys/Optics
J.J.M. Braat ImPhys/Optics
Research Group
ImPhys/Optics
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Published Date

2009

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Undefined/Unknown

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Research Group

ImPhys/Optics

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