Enhanced imaging in Extreme UV lithography by optimising the Molybdenum/Silicon thickness ratio in 2-D phase shifting mask design.

Poster (2005)

Authors

A.M. Nugrowati ImPhys/Optics
A.S. van de Nes ImPhys/Optics
Silvania Pereira ImPhys/Optics
JJM Braat ImPhys/Optics
Research Group
ImPhys/Optics
More Info
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Published Date

2005

Language

Undefined/Unknown

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Research Group

ImPhys/Optics

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