Y van Andel | TU Delft Repository

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Y van Andel

Conference paper (2)

Journal article (2)

4 records found

1

Large Polycrystalline Silicon Grains Prepared by Excimer Laser Crystallization of Sputtered Amorphous Silicon Film with Process Temperature at 100C

Journal article (2007) - M He (author), R. Ishihara (author), Ryoichi Ishihara (author), R Ishihara (author), EJJ Neihof (author), Y van Andel (author), H Schellevis (author), H. Schellevis (author), JW Metselaar (author), C. W J Beenakker (author), C.I.M. Beenakker (author)

A novel Selected Area Laser Assisted (SALA) system for crystallization and doping processes in low-temperature poly-Si thin-film transistors

Journal article (2006) - R. Ishihara (author), R Ishihara (author), Ryoichi Ishihara (author), A Glazer (author), JW Metselaar (author), C. W J Beenakker (author), C.I.M. Beenakker (author), S Stolyarova (author), Y Nemirovsky (author), Y Raab (author), P Rusian (author), M Dorfan (author), B Lavi (author), I Leizerson (author), A Kishinevsky (author), Y van Andel (author), X Cao (author)

Preparation of large, location-controlled Si grains by excimer laser crystallization of ¿-Si film sputtered at 100 °C

Conference paper (2006) - M He (author), EJJ Neihof (author), Y van Andel (author), H Schellevis (author), H. Schellevis (author), R. Ishihara (author), Ryoichi Ishihara (author), R Ishihara (author), JW Metselaar (author), C. W J Beenakker (author), C.I.M. Beenakker (author)

Preparation of large poly-Si grains by excimer laser crystallization of sputtered a-Si film with processing temperature of 100 °C

Conference paper (2006) - M He (author), Ryoichi Ishihara (author), R Ishihara (author), R. Ishihara (author), EJJ Neihof (author), Y van Andel (author), H Schellevis (author), H. Schellevis (author), C.I.M. Beenakker (author), C. W J Beenakker (author)