Preparation of large, location-controlled Si grains by excimer laser crystallization of ¿-Si film sputtered at 100 °C

He, M; Neihof, EJJ; van Andel, Y; Schellevis, H; Ishihara, R.; Metselaar, JW; Beenakker, C. W J

Preparation of large, location-controlled Si grains by excimer laser crystallization of ¿-Si film sputtered at 100 °C

Conference paper (2006)

Authors

M He Electronic Components, Technology and Materials -

EJJ Neihof Electronic Components, Technology and Materials -

Y van Andel Electronic Components, Technology and Materials -

H Schellevis Electronic Components, Technology and Materials -

R. Ishihara Electronic Components, Technology and Materials -

JW Metselaar Electronic Components, Technology and Materials -

C. W J Beenakker Electronic Components, Technology and Materials -

Research Group

Electronic Components, Technology and Materials () (TU Delft)

Elektrotechniek Techniek

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Published Date

2006

Language

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Faculty

Electrical Engineering, Mathematics and Computer Science

Department

Microelectronics

Research Group

Electronic Components, Technology and Materials