3 records found
1
Large Polycrystalline Silicon Grains Prepared by Excimer Laser Crystallization of Sputtered Amorphous Silicon Film with Process Temperature at 100C
Preparation of large, location-controlled Si grains by excimer laser crystallization of ¿-Si film sputtered at 100 °C
Preparation of large poly-Si grains by excimer laser crystallization of sputtered a-Si film with processing temperature of 100 °C