The phenomenon of hot carriers, which are generated through the nonradiative decay of surface plasmons in ultrathin metallic films, offers an intriguing opportunity for subbandgap photodetection even at room temperature. These hot carriers possess sufficient energy to inject into the conduction band of a semiconductor material. The groundbreaking use of iridium (Ir) ultrathin film as an ultraviolet (UV) plasmonic material on silicon (Si) for high-performance photodetectors (PHDs) has been successfully demonstrated. Elevating the thickness of the sputtered Ir film to 4 nm yields a notable surge in photocurrent, registering an impressive 600 μA under 365 nm UV illumination with electron mobility of 1.37E3 cm² V⁻¹ s. This PHD exhibits excellent OFF-ON photoresponses at various applied voltages ranging from 0 to 5 V, maintaining a stable photocurrent. Under UV illumination, it displays exceptional performance, achieving a high detectivity of 1.25E14 Jones and a responsivity of 1.28 A W⁻¹. These outstanding results underscore the significant advantages of increasing the thickness of the Ir film in PHDs, leading to improvements in conductivity, detectivity, external quantum efficiency, responsivity, as well as superior sensitivity for light detection.

This study focused on investigating the optoelectronic properties of molybdenum trioxide (α-MoO₃) thin films using the atomic layer deposition (ALD) technique through different cycle numbers and theoretical investigation. Initial band gap calculations using standard DFT with GGA-PBE resulted in a value of 1.19 eV, which deviated significantly from experimental measurements. The GGA + U method with Hubbard U corrections was applied for the first time to improve the accuracy. This refinement led to a more precise band gap value of 3.09 eV, closely matching previously reported experimental data. The electronic parameters of the α-MoO₃ photodetector, such as ideality factor (n), barrier height (Φ₀), and series resistance (R_s), were analyzed using the thermionic emission theory and confirmed by Cheung and Nord's methods. The results demonstrated that the sample deposited with 100 pulses exhibited higher photodetector performance under UV illumination, despite having a lower R_s.

The efficiency of ultraviolet (UV) illumination in gas adsorption/desorption is remarkable due to its capacity to activate and energize CO₂ molecules, rendering them more reactive and prone to surface interactions. A heterojunction device for room-temperature optoelectronic gas sensing has been fabricated. This was achieved through the deposition of an orthorhombic vanadium pentoxide (V₂O₅) thin film onto a wafer scale 2D p-type tungsten disulfide (WS₂)/silicon (Si). The incorporation of the V₂O₅ layer brings about alterations in WS₂'s electronic properties, resulting in increased energy states for photo-generated carriers and a promising approach to enhance the intensity of exciton and trion peaks. Specifically, the WS₂ film exhibits a carrier concentration of 3.67 × 10¹⁸ cm⁻³, while incorporating the V₂O₅ layer significantly raises this concentration to 1.20 × 10²⁰ cm⁻³. The experiments reveal a rapid response time of 0.4 s and a recovery time of 0.2 s, respectively, demonstrating the swift desorption capability of the device in a CO₂ environment. Remarkably, this device exhibits high optoelectronic performances, boasting a detectivity of 1.22 × 10¹³ Jones and a responsivity of 177.21 A/W. These findings have the potential to advance the development of improved gas-sensing devices, offering heightened sensitivity and selectivity in diverse optoelectronic applications.

Ultrathin MoO₃ semiconductor nanostructures have garnered significant interest as a promising nanomaterial for transparent nano- and optoelectronics, owing to their exceptional reactivity. Due to the shortage of knowledge about the electronic and optoelectronic properties of MoO₃/n-Si via an ALD system of few nanometers, we utilized the preparation of an ultrathin MoO₃ film at temperatures of 100, 150, 200, and 250 °C. The effect of the depositing temperatures on using bis(tbutylimido)bis(dimethylamino)molybdenum (VI) as a molybdenum source for highly stable UV photodetectors were reported. The ON–OFF and the photodetector dynamic behaviors of these samples under different applied voltages of 0, 0.5, 1, 2, 3, 4, and 5 V were collected. This study shows that the ultrasmooth and homogenous films of less than a 0.30 nm roughness deposited at 200 °C were used efficiently for high-performance UV photodetector behaviors with a high sheet carrier concentration of 7.6 × 10¹⁰ cm⁻² and external quantum efficiency of 1.72 × 10¹¹. The electronic parameters were analyzed based on thermionic emission theory, where Cheung and Nord’s methods were utilized to determine the photodetector electronic parameters, such as the ideality factor (n), barrier height (Φ₀), and series resistance (R_s). The n-factor values were higher in the low voltage region of the I–V diagram, potentially due to series resistance causing a voltage drop across the interfacial thin film and charge accumulation at the interface states between the MoO₃ and Si surfaces.

Gold (Au) nanoparticles trapped within Cu₂SnS₃ (CTS) thin films were effectively deposited on a low-cost glass substrate using a simple pulsed laser deposition of 15 mJ for 5 ns at a 10 Hz repetition rate. The film's structural, morphological, topography, optical, and optoelectronic properties were investigated. Highly crystalline ternary chalcogenide CTS with tetragonal symmetry and 17 nm grain size is prepared. The 110 Ω resistivity of the thin film increases up to 125 Ω indicating a negative photoresponse under visible light excitation. The decrease in the photocurrent is also observed with Cu₂SnS₃/Au/Cu₂SnS₃ sandwich ternary chalcogenide structure at resistivities values from 31 to 35 Ω and a Joule effect influence the presence of plasmonic Au nanoparticle interlayers involved a lower phonon disorder given a higher photoresponse effect as predicted from Urbach energy.

This study was on the optoelectronic properties of multilayered two-dimensional MoS₂ and WS₂ materials on a silicon substrate using sputtering physical vapor deposition (PVD) and chemical vapor deposition (CVD) techniques. For the first time, we report ultraviolet (UV) photoresponses under air, CO₂, and O₂ environments at different flow rates. The electrical Hall effect measurement showed the existence of MoS₂ (n-type)/Si (p-type) and WS₂ (P-type)/Si (p-type) heterojunctions with a higher sheet carrier concentration of 5.50 × 10⁵ cm⁻² for WS₂ thin film. The IV electrical results revealed that WS₂ is more reactive than MoS₂ film under different gas stimuli. WS₂ film showed high stability under different bias voltages, even at zero bias voltage, due to the noticeably good carrier mobility of 29.8 × 10² cm²/V. WS₂ film indicated a fast rise/decay time of 0.23/0.21 s under air while a faster response of 0.190/0.10 s under a CO₂ environment was observed. Additionally, the external quantum efficiency of WS₂ revealed a remarkable enhancement in the CO₂ environment of 1.62 × 10⁸ compared to MoS₂ film with 6.74 × 10⁶. According to our findings, the presence of CO₂ on the surface of WS₂ improves such optoelectronic properties as photocurrent gain, photoresponsivity, external quantum efficiency, and detectivity. These results indicate potential applications of WS₂ as a photodetector under gas stimuli for future optoelectronic applications.

Vanadium oxide (VO₂) is considered a Peierls–Mott insulator with a metal–insulator transition (MIT) at T_c = 68^◦ C. The tuning of MIT parameters is a crucial point to use VO₂ within thermoelectric, electrochromic, or thermochromic applications. In this study, the effect of oxygen deficiencies, strain engineering, and metal tungsten doping are combined to tune the MIT with a low phase transition of 20^◦C in the air without capsulation. Narrow hysteresis phase transition devices based on multilayer VO₂, WO₃, Mo_0.2W_0.8O_3, and/or MoO₃ oxide thin films deposited through a high vacuum sputtering are investigated. The deposited films are structurally, chemically, electrically, and optically characterized. Different conductivity behaviour was observed, with the highest value towards VO_1.75/WO_2.94 and the lowest VO_1.75 on FTO glass. VO_1.75/WO_2.94 showed a narrow hysteresis curve with a single-phase transition. Thanks to the role of oxygen vacancies, the MIT temperature decreased to 35^◦C, while the lowest value (T_c = 20^◦C) was reached with Mo_0.2W_0.8O₃/VO₂/MoO₃ structure. In this former sample, Mo_0.2W_0.8O₃ was used for the first time as an anti-reflective and anti-oxidative layer. The results showed that the MoO₃ bottom layer is more suitable than WO₃ to enhance the electrical properties of VO₂ thin films. This work is applied to fast phase transition devices.

The application of the photonic superlattice in advanced photonics has become a demanding field, especially for two-dimensional and strongly correlated oxides. Because it experiences an abrupt metal-insulator transition near ambient temperature, where the electrical resistivity varies by orders of magnitude, vanadium oxide (VO2) shows potential as a building block for infrared switching and sensing devices. We reported a first principle study of superlattice structures of VO2 as a strongly correlated phase transition material and tungsten diselenide (WSe2) as a two-dimensional transition metal dichalcogenide layer. Based on first-principles calculations, we exploit the effect of semiconductor monoclinic and metallic tetragonal state of VO2 with WSe2 in a photonic superlattices structure through the near and mid-infrared (NIR-MIR) thermochromic phase transition regions. By increasing the thickness of the VO2 layer, the photonic bandgap (PhB) gets red-shifted. We observed linear dependence of the PhB width on the VO2 thickness. For the monoclinic case of VO2, the number of the forbidden bands increase with the number of layers of WSe2. New forbidden gaps are preferred to appear at a slight angle of incidence, and the wider one can predominate at larger angles. We presented an efficient way to control the flow of the NIR-MIR in both summer and winter environments for phase transition and photonic thermochromic applications. This study's findings may help understand vanadium oxide's role in tunable photonic superlattice for infrared switchable devices and optical filters.

The negative charge trapped in the oxygen species present in metal oxides like Tin Oxide (SnO₂) caused an upward band bending and makes these materials as promising sensing materials for CO₂ detection. However, sensors based on pure SnO₂ may only detect CO₂ at high temperature making them un-sensitive at room temperature (RT) (20 °C). In this study, SnO₂ and Cobalt doped SnO₂ (Co:SnO₂) thin films of varying thickness were successfully synthesized by sol-gel spin coating technique, followed by annealing. The highly active surface due to high number of divided layers has been determined by X-ray diffraction (XRD) for neat and doped SnO₂ deposition. Moreover, the effect of increasing the annealing from 400 to 500 °C has been evaluated. The calculated band gap of the multilayer sample annealed at 500 °C blue shifted from 3.55 to 3.81 eV with the Co doping. Therefore, the Co doped SnO₂ can detect CO₂ as low as 30 vol% in atmosphere at RT, meanwhile the un-doped SnO₂ coating shows a weak response. Moreover, at high CO₂ concentration the recovery time decreases due to the high desorption kinetic. The obtained results illustrate the control of the film's properties gives the opportunity to manage the sensing and optoelectronic performance.

The distinctive properties of strongly correlated oxides provide a variety of possibilities for modulating the properties of 2D transition metal dichalcogenides semiconductors; which represent a new class of superior optical and optoelectronic interfacing semiconductors. We report a novel approach to scaling-up molybdenum disulfide (MoS₂) by combining the techniques of chemical and physical vapor deposition (CVD and PVD) and interfacing with a thin layer of monoclinic VO₂. MoWO₃/VO₂/MoS₂ photodetectors were manufactured at different sputtering times by depositing molybdenum oxide layers using a PVD technique on p-type silicon substrates followed by a sulphurization process in the CVD chamber. The high quality and the excellent structural and absorption properties of MoWO₃/VO₂/MoS₂/Si with MoS₂ deposited for 60 s enables its use as an efficient UV photodetector. The electronically coupled monoclinic VO₂ layer on MoS₂/Si causes a redshift and intensive MoS₂ Raman peaks. Interestingly, the incorporation of VO₂ dramatically changes the ratio between A-exciton (ground state exciton) and trion photoluminescence intensities of VO₂/(30 s)MoS₂/Si from < 1 to > 1. By increasing the deposition time of MoS₂ from 60 to 180 s, the relative intensity of the B-exciton/A-exciton increases, whereas the lowest ratio at deposition time of 60 s refers to the high quality and low defect densities of the VO₂/(60 s)MoS₂/Si structure. Both the VO₂/(60 s)MoS₂/Si trion and A-exciton peaks have higher intensities compared with (60 s) MoS₂/Si structure. The MoWO₃/VO₂/(60 s)MoS₂/Si photodetector displays the highest photocurrent gain of 1.6, 4.32 × 10⁸ Jones detectivity, and ~ 1.0 × 10¹⁰ quantum efficiency at 365 nm. Moreover, the surface roughness and grains mapping are studied and a low semiconducting-metallic phase transition is observed at ~ 40 °C.

Molybdenum - tungsten oxide (Mo_1-xW_xO₃, x = 1, 0.8, and 0.6) nanostructured thin films-based room temperture (RT) gas sensors are prepared by means of reactive RF magnetron co-sputtering at 400 °C. The structural, morphology, topography, optical, and electrical characterizations of the prepared sensors are carried out by XRD Rietveld structure refinement analyses, SEM, AFM, UV-VIS spectrophotometer, and source meter. By controlling the deposition temperture of 400 °C, a co-existing phase of MoO₃ and MoO₂ in WO₃ matrix is presented with high oxygen vacancies concentration as calculated from the XRD Rietveld Refinement analyses. By increasing the Mo content, the calculated oxygen vacancies concentration increases by factor of 1.36. The optical characterization of Mo_0.2W_0.8O₃ thin film shows a high transparent of 99.6% at 500 nm. The prepared thin films have successfully tested to detect carbon dioxide (CO₂) at RT (20 °C) with high selectivity and repeatability. The Mo_0.4W_0.6O₃ sensor film shows an electrical Schottky contact with fast response and recovery times towards CO₂ under UV light activation. Mo_0.4W_0.6O₃ thin film under dark and UV conditions were able to detect low CO₂ concentration of 2 and 0.5 sccm CO₂ at RT, respectively. Under UV illumination, Mo_0.4W_0.6O₃ film shows a fast response and recovery time of 6.53 and 8.05 s at 0.5 sccm with sensitivity of 29.19%. Under UV photonic activation, higher electron concentration is presented in the oxide surface, which leads to high probability for reaction with CO₂ molecules, and consequently enhanced the chemisorption of CO₂. The enhanced CO₂ gas sensitivity and fast response may refer to the high oxygen vacancies concentration and the active role of the grain boundaries in MoO₂, MoO₃ and WO₃ mixed-valence nanostructured under UV activation.

Effect of in-/ex-situ annealing on the structure, optical, photoluminescence, electrical characterization and gas sensing dynamics on CdS thin films are presented. Raman characterizations showed an increase in the peak intensity with increasing the annealing temperature under ex-situ, while a lower peak intensity observed through the in-situ annealing condition. No shift was observed in the Photoluminescence peaks through the yellow band peaks of in-situ annealed samples, however, a slightly blue shift was observed through the ex-situ annealed samples. High conductivity was observed for all samples, while in the case of in-situ RT, in-situ 100 °C, ex-situ 200 °C and ex-situ 300 °C, a CO₂ and O₂ gas sensing activity have been tested. The ex-situ 300 °C sample shows a higher response towards CO₂ compared with the ex-situ 200 °C film. While, both in-situ RT and 100 °C sensors show the same response towards CO₂ with a high gas response. However, the in-situ 100 °C sensor has the highest response compared to in-situ RT film with a high response of 25% at 50 sccm towards O₂.

The greenhouse effect is involving global heating and climate change within the world. Carbon dioxide (CO₂)is one of the major gas at the origin of this effect, but also the byproduct of human activity. Therefore, monitoring the indoor/outdoor CO₂ emission by gas sensors is one of the priorities for environmental preservation. In this paper, the sensing performance of CO₂ towards two different O-rich films have been studied; graphene oxide (GO)and vanadium dioxide (VO₂). The preparation of GO film has been carried out by spray pyrolysis on fluorine tin oxide (FTO)prepared by the modified Hummers method. While the VO2 film has been sol-gel spin-coated on a glass substrate. Both films have been characterized using XRD, SEM and electrical properties. The CO₂ gas sensing mechanism and the role of oxygen vacancies in VO₂ are addressing. The oxygen functional groups in GO play a main role in the CO₂ gas the sensitivity level and response time. Their gas sensing performances have been investigated based on measuring the response vs recovery time, dynamic response curve analysis and sensitivity. In order to better understand the sensing mechanism, characterization has been done with different gas concentrations. Both GO and VO₂ based CO₂-sensors are acted as an n-type sensor. Sensing behavior of GO at RT has explained to be mainly mediated by the oxygen functional groups and a wide range of active sites. In the other hand, VO₂ contains oxygen vacancies and more defect sites which play a main role in the RT sensing activity and low recovery time.