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Oxidized ALD-deposited titanium nitride films as a low-temperature alternative for enhancing the wettability of through-silicon vias

Conference paper (2009)

Authors

M Saadaoui Electronic Components, Technology and Materials
Henk Van Zeijl Electronic Components, Technology and Materials
HTM Pham Old - EWI Sect. ECTM
HC MKnoops External organisation
WMM Kessels External organisation
MCM van de Sanden External organisation
F Roozeboom External organisation
Y Lamy External organisation
KB Jinesh Electronic Components, Technology and Materials
W. Besling External organisation
Pasqualina Maria Sarro Electronic Components, Technology and Materials
Research Group
Electronic Components, Technology and Materials
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Published Date

2009

Language

Undefined/Unknown

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Research Group

Electronic Components, Technology and Materials

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