SiOFx and SiO2 deposition in an ECR-HDP reactor: Tool characterisation and film analysis

Journal article (1997)

Authors

AJ Kalkman QN/Fysics of NanoElectronics
DJ de Boer External organisation
H Fukuda External organisation
JBC van de Hilst External organisation
G.C.A.M. Janssen OLD Metals Processing, Microstructures and Properties
S Radelaar OLD Metals Processing, Microstructures and Properties
Research Group
QN/Fysics of NanoElectronics
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Published Date

1997

Language

Undefined/Unknown

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Research Group

QN/Fysics of NanoElectronics