Molybdenum - tungsten oxide (Mo1-xWxO3, x = 1, 0.8, and 0.6) nanostructured thin films-based room temperture (RT) gas sensors are prepared by means of reactive RF magnetron co-sputtering at 400 °C. The structural, morphology, topography, optical,
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Molybdenum - tungsten oxide (Mo1-xWxO3, x = 1, 0.8, and 0.6) nanostructured thin films-based room temperture (RT) gas sensors are prepared by means of reactive RF magnetron co-sputtering at 400 °C. The structural, morphology, topography, optical, and electrical characterizations of the prepared sensors are carried out by XRD Rietveld structure refinement analyses, SEM, AFM, UV-VIS spectrophotometer, and source meter. By controlling the deposition temperture of 400 °C, a co-existing phase of MoO3 and MoO2 in WO3 matrix is presented with high oxygen vacancies concentration as calculated from the XRD Rietveld Refinement analyses. By increasing the Mo content, the calculated oxygen vacancies concentration increases by factor of 1.36. The optical characterization of Mo0.2W0.8O3 thin film shows a high transparent of 99.6% at 500 nm. The prepared thin films have successfully tested to detect carbon dioxide (CO2) at RT (20 °C) with high selectivity and repeatability. The Mo0.4W0.6O3 sensor film shows an electrical Schottky contact with fast response and recovery times towards CO2 under UV light activation. Mo0.4W0.6O3 thin film under dark and UV conditions were able to detect low CO2 concentration of 2 and 0.5 sccm CO2 at RT, respectively. Under UV illumination, Mo0.4W0.6O3 film shows a fast response and recovery time of 6.53 and 8.05 s at 0.5 sccm with sensitivity of 29.19%. Under UV photonic activation, higher electron concentration is presented in the oxide surface, which leads to high probability for reaction with CO2 molecules, and consequently enhanced the chemisorption of CO2. The enhanced CO2 gas sensitivity and fast response may refer to the high oxygen vacancies concentration and the active role of the grain boundaries in MoO2, MoO3 and WO3 mixed-valence nanostructured under UV activation.
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