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CA Donelly
Academic Work (1)
Journal article (1)
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Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
Journal article (2013) -
T Usui (author)
,
CA Donelly (author)
,
M Logar (author)
,
R Sinclair (author)
,
Joop Schoonman (author)
,
J. Schoonman (author)
,
J Schoonman (author)
,
FB Prinz (author)
