Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition

Journal article (2013)

Authors

T Usui External organisation
CA Donelly External organisation
M Logar External organisation
R Sinclair External organisation
J. Schoonman ChemE/Materials for Energy Conversion and Storage - AS
FB Prinz External organisation
Research Group
ChemE/Materials for Energy Conversion and Storage (AS) (TU Delft)
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Published Date

2013

Language

Undefined/Unknown

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Faculty

Applied Sciences

Department

ChemE/Chemical Engineering

Research Group

ChemE/Materials for Energy Conversion and Storage