Resistive RAM (RRAM) is a promising technology to replace traditional technologies such as Flash, because of its low energy consumption, CMOS compatibility, and high density. Many companies are prototyping this technology to validate its potential. Bringing this technology to the market requires high-quality tests to ensure customer satisfaction. Hence, it is of great importance to deeply understand manufacturing defects and accurately model them to develop optimal tests. This paper presents a holistic framework for defect and fault modeling that enables the development of optimal tests for RRAMs. An overview and classification of RRAM manufacturing defects are provided. Defects in contacts and interconnects are modeled as resistors. Unique RRAM defects, e.g., forming defects, require Device-Aware defect modeling which incorporates the defect's impact on the device's electric properties by adjusting the affected technology and electrical parameters. Additionally, a systematic approach to define the fault space is presented, followed by a methodology to validate this space. With this methodology, accurate fault modeling for contact, interconnect, and forming defects is performed and tests are developed. The tests are able to detect all faults in a time-efficient manner, thereby proving the effectiveness of the framework. Finally, an outlook on future RRAM testing is presented.

@en

The manufacturing process of STT-MRAM requires unique steps to fabricate and integrate magnetic tunnel junction (MTJ) devices which are data-storing elements. Thus, understanding the defects in MTJs and their faulty behaviors are paramount for developing high-quality test solutions. This article applies the advanced device-aware test to intermediate (IM) state defects in MTJ devices based on silicon measurements and circuit simulations. An IM state manifests itself as an abnormal third resistive state, which differs from the two bi-stable states of MTJ. We performed silicon measurements on MTJ devices with diameter ranging from 60nm to 120nm; the results show that the occurrence probability of IM state strongly depends on the switching direction, device size, and bias voltage. We demonstrate that the conventional resistor-based fault modeling and test approach fails to appropriately model and test such a defect. Therefore, device-aware test is applied. We first physically model the defect and incorporate it into a Verilog-A MTJ compact model and calibrate it with silicon data. Thereafter, this model is used for a systematic fault analysis based on circuit simulations to obtain accurate and realistic faults in a pre-defined fault space. Our simulation results show that an IM state defect leads to intermittent write transition faults. Finally, we propose and implement a device-aware test solution to detect the IM state defect.

@en

STT-MRAM has long been a promising non-volatile memory solution for the embedded application space owing to its attractive characteristics such as non-volatility, low leakage, high endurance, and scalability. However, the operating requirements for high-performance computing (HPC) and low power (LP) applications involve different challenges. This paper addresses different aspects of STT-MRAM; it will cover state-of-the-art, some new results and future challenges related to technology, design and test. While STT-MRAM devices have shown encouraging performance metrics at device-level, a key challenge has been achieving backend-of-line (BEOL) CMOS compatibility, while retaining the benefits of low power operation. Scaling demands to improve data densities have placed additional challenges in terms of addressing the impact of process-induced damage on device performance at CD < 100 nm. In addition, the paper discusses the design of reliable read mechanism considering the variability effects. Moreover, the failure of traditional fault modeling and test approaches in model STT-MRAM unique defects for appropriate test solutions is demonstrated in this paper based on silicon data.

@en

Understanding the defects in magnetic tunnel junctions (MTJs) and their faulty behaviors are paramount for developing high-quality tests for STT-MRAM. This paper characterizes and models intermediate (IM) state defects in MTJs; IM state manifests itself as an abnormal third resistive state, apart from the two bi-stable states of MTJ. We performed silicon measurements on MTJ devices with diameter ranging from 60 nm to 120 nm; the results reveal that the occurrence probability of IM state strongly depends on the switching direction, device size, and applied bias voltage. To test such defect, appropriate fault models are needed. Therefore, we use the advanced device-aware modeling approach, where we first physically model the defect and incorporate it into a Verilog-A MTJ compact model and calibrate it with silicon data. Thereafter, we use a systematic fault analysis to accurately validate a theoretically predefined fault space and derive realistic fault models. Our simulation results show that the IM state defect causes intermittent write transition faults. This paper also demonstrates that the conventional resistor-based fault modeling and test approach fails in appropriately modeling IM defects, and hence incapable of detecting such defects.@en

As STT-MRAM mass production and deployment in industry is around the corner, high-quality yet cost-efficient manufacturing test solutions are crucial to ensure the required quality of products being shipped to end customers. This dissertation focuses on STT-MRAM testing, covering three abstraction levels: manufacturing defects, fault models, and test solutions. We apply the advanced device-aware test (DAT) approach to STT-MRAM defects, including resistive defects on interconnects and STT-MRAM device-internal defects such as pinhole defects, synthetic anti-ferromagnet flip defects, intermediate state defects. With the derived accurate defect models calibrated by silicon data, a comprehensive fault analysis based on SPICE circuit simulations is performed. STT-MRAM unique faults are identified, including both permanent faults and intermittent faults. Based on the obtain fault models, high-quality test solutions are proposed. Additionally, this dissertation also explores the impact of magnetic coupling and density on STT-MRAM performance for robust designs. @en

Manufacturing defects can cause hard-to-detect (HTD) faults in fin field-effect transistor (FinFET) static random access memories (SRAMs). Detection of these faults, such as random read outputs and out-of-spec parametric deviations, is essential when testing FinFET SRAMs. Undetected HTD faults result in test escapes, which lead to early in-field failures. This article presents a detailed analysis of HTD faults in FinFET SRAMs by exploring their sensitization and discussing solutions to improve HTD fault coverage during manufacturing testing. We first define the fault space for SRAMs and classify all faults in the space. Following this, we perform a systematic fault analysis based on injecting resistive defects in a memory cell, inspecting its behavior, and identifying HTD faults. Furthermore, we survey existing test solutions and discuss their HTD fault coverage and limitations. Based on our analysis, it is clear that no single test solution can fully detect all HTD faults, thus leading to test escapes. Hence, there is a need for new and more efficient test solutions. Improved detection of HTD faults could be achieved by using parametric test solutions, proposing solutions that cover yet-untargeted HTD faults, combining multiple test approaches into a single solution, and further exploring stress conditions. These new approaches would reduce test escapes and therefore improve the quality of FinFET SRAMs.@en

Understanding the manufacturing defects in magnetic tunnel junctions (MTJs), which are the data-storing elements in STT-MRAMs, and their resultant faulty behaviors are crucial for developing high-quality test solutions. This paper introduces a new type of MTJ defect: synthetic anti-ferromagnet flip (SAFF) defect, wherein the magnetization in both the hard layer and reference layer of MTJ devices undergoes an unintended flip to the opposite direction. Both magnetic and electrical measurement data of SAFF defect in fabricated MTJ devices is presented; it shows that such a defect reverses the polarity of stray field at the free layer of MTJ, while it has no electrical impact on the single isolated device. The paper also demonstrates that using the conventional fault modeling and test approach fails to appropriately model and test such a defect. Therefore device-Aware fault modeling and test approach is used. It first physically models the defect and incorporate it into a Verilog-A MTJ compact model, which is afterwards calibrated with silicon data. The model is thereafter used for fault analysis and modeling within an STT-MRAM array; simulation results show that a SAFF defect may lead to an intermittent Passive Neighborhood Pattern Sensitive Fault (PNPSF1i) when all neighboring cells are in logic '1' state. Finally, test solutions for such fault are discussed.

@en

Emerging memristor-based architectures are promising for data-intensive applications as these can enhance the computation efficiency, solve the data transfer bottleneck and at the same time deliver high energy efficiency using their normally-off/instant-on attributes. However, their storing devices are more susceptible to manufacturing defects compared to the traditional memory technologies because they are fabricated with new materials and require different manufacturing processes. Hence, in order to ensure correct functionalities for these technologies, it is necessary to have accurate fault modeling as well as proper test methodologies with high test coverage. In this paper, we propose technology specific cell-level defect modeling, accurate fault analysis and yield improvement solutions for memristor-based memory as well as Computation-In-Memory (CIM) architectures. Our overall contributions cover three abstraction levels, namely, device, architecture and system. First, we propose a device-aware test methodology in which we have introduced a key device-level characteristic to develop accurate defect model. Second, we demonstrate a yield analysis framework for memristor arrays considering reliability and permanent faults due to parametric variations and explore fault-tolerant solutions. Third, a lightweight on-line test and repair schemes is proposed for emerging CIM devices in machine learning applications.

@en

Manufacturing defects can cause faults in FinFET SRAMs. Of them, easy-to-detect (ETD) faults always cause incorrect behavior, and therefore are easily detected by applying sequences of write and read operations. However, hard-to-detect (HTD) faults may not cause incorrect behavior, only parametric deviations. Detection of these faults is of major importance as they may lead to test escapes. This paper proposes a new design-for-testability (DFT) scheme for FinFET SRAMs to detect such faults by creating a mismatch in the sense amplifier (SA). This mismatch, combined with the defect in the cell, will incorrectly bias the SA and cause incorrect read outputs. Furthermore, post-silicon calibration schemes can be used to avoid over-testing or test escapes caused by process variation effects. Compared to the state of the art, this scheme introduces negligible overheads in area and test time while it significantly improves fault coverage and reduces the number of test escapes.

@en

As a unique mechanism for MRAMs, magnetic coupling needs to be accounted for when designing memory arrays. This paper models both intra- and inter-cell magnetic coupling analytically for STT-MRAMs and investigates their impact on the write performance and retention of MTJ devices, which are the data-storing elements of STT-MRAMs. We present magnetic measurement data of MTJ devices with diameters ranging from 35 nm to 175 nm, which we use to calibrate our intra-cell magnetic coupling model. Subsequently, we extrapolate this model to study inter-cell magnetic coupling in memory arrays. We propose the inter-cell magnetic coupling factor Ψ to indicate coupling strength. Our simulation results show that Ψ≈2% maximizes the array density under the constraint that the magnetic coupling has negligible impact on the device's performance. Higher array densities show significant variations in average switching time, especially at low switching voltages, caused by inter-cell magnetic coupling, and dependent on the data pattern in the cell's neighborhood. We also observe a marginal degradation of the data retention time under the influence of inter-cell magnetic coupling.@en

This paper introduces a new test approach: device-aware test (DAT) for emerging memory technologies such as MRAM, RRAM, and PCM. The DAT approach enables accurate models of device defects to obtain realistic fault models, which are used to develop high-quality and optimized test solutions. This is demonstrated by an application of DAT to pinhole defects in STT-MRAMs and forming defects in RRAMs.@en

STT-MRAM mass production is around the corner as major foundries worldwide invest heavily on its commercialization. To ensure high-quality STT-MRAM products, effective yet cost-efficient test solutions are of great importance. This article presents a systematic device-aware defect and fault modeling framework for STT-MRAM to derive accurate fault models which reflect the physical defects appropriately, and thereafter optimal and high-quality test solutions. An overview and classification of manufacturing defects in STT-MRAMs are provided with an emphasis on those related to the fabrication of magnetic tunnel junction (MTJ) devices, i.e., the data-storing elements. Defects in MTJ devices need to be modeled by adjusting the affected technology parameters and subsequent electrical parameters to fully capture the defect impact on both the device's electrical and magnetic properties, whereas defects in interconnects can be modeled as linear resistors. In addition, a complete single-cell fault space and nomenclature are defined, and a systematic fault analysis methodology is proposed. To demonstrate the use of the proposed framework, resistive defects in interconnect and pinhole defects in MTJ devices are analyzed for a single 1T-1MTJ memory cell. Test solutions for detecting these defects are also discussed.

@en

This paper proposes a new test approach that goes beyond cell-aware test, i.e., device-aware test. The approach consists of three steps: defect modeling, fault modeling, and test/DfT development. The defect modeling does not assume that a defect in a device (or a cell) can be modeled electrically as a linear resistor (as the traditional approach suggests), but it rather incorporates the impact of the physical defect on the technology parameters of the device and thereafter on its electrical parameters. Once the defective electrical model is defined, a systematic fault analysis (based on fault simulation) is performed to derive appropriate fault models and subsequently test solutions. The approach is demonstrated using two memory technologies: resistive random access memory (RRAM) and spin-transfer torque magnetic random access memory (STT-MRAM). The results show that the proposed approach is able to sensitize faults for defects that are not detected with the traditional approach, meaning that the latter cannot lead to high-quality test solutions as required for a defective part per billion (DPPB) level. The new approach clearly sets up a turning point in testing for at least the considered two emerging memory technologies.@en

The STT-MRAM manufacturing process involves not only traditional CMOS process steps, but also the integration of magnetic tunnel junction (MTJ) devices, the data-storing elements. This paper demonstrates a paradigm shift in fault modeling for STT-MRAMs by performing defect modeling and fault analysis for MTJ pinhole defects which are seen as a key type of STT-MRAM manufacturing defects. A Verilog-A compact model for defect-free MTJ devices is built and calibrated with electrical measurements on actual MTJ wafers. MTJs with a pinhole defect are extensively characterized, both during manufacturing test (t=0) and in the field (t>0), and the data is used to extend our defect-free MTJ compact model to include parameterized pinhole defects. The model is then used to perform single-cell static fault analysis and this shows not only what kind of faults can occur in an STT-MRAM, but also that the conventional fault modeling approach based on linear resistors cannot catch such behavior.@en

Spin-transfer-torque magnetic RAM (STT-MRAM) is one of the most promising emerging memory technologies. As various manufacturing vendors make significant efforts to push it to the market, appropriate STT-MRAM testing is of
great importance. In this paper, we demonstrate that conventional STT-MRAM defect modeling, which is based on linear resistors, is too pessimistic in representing the real nature of physical defects. It may result in incorrect fault models, which in turn can lead to low-quality test solutions. In addition, we propose a generic defect modeling methodology which captures the nonlinear behavior of STT-MRAM defects accurately; a defect is modeled by adjusting the affected STT-MRAM technology parameters. The methodology is illustrated by two examples, namely a pinhole defect and a sidewall redeposition defect, which are simulated for accurate fault modeling. In case of a pinhole defect, the STT-MRAM suffers from a fast transition between magnetic tunnel junction (MTJ) states with increased write current, making the MTJ more vulnerable to breakdown. However, with the conventional linear resistor as defect model the memory shows a slow transition or even a transition failure. Similarly, a sidewall redeposition defect causes a fast transition without current elevation, which is not observed when using the conventional approach.@en