6 records found
1
Optimum dose for shot noise limited CD uniformity in E-beam lithography
Design report maskless system, rapport aan Mapper Lithography B.V.
System optimization model description, rapport aan Mapper Lithography B.V.
Overview of MAPPER system concept
Design of the electron optical part of the mapper machine.
Failure analysis of an eletrical drive system with a transverse flux machine (TFM)
