VA Sidorkin | TU Delft Repository

V

VA Sidorkin

Doctoral thesis (1)

Journal article (7)

8 records found

1

Resist and Exposure Processes for Sub-10-nm Electron and Ion Beam Lithography

Doctoral thesis (2010) - VA Sidorkin (author)

Nanofabrication with the helium ion microscope, in 'Metrology, Inspection and process control for microlithography XXIV

Journal article (2010) - D Maas (author), E van Veldhoven (author), P Chen (author), VA Sidorkin (author), H.W.M. Salemink (author), E.W.J.M. van der Drift (author), P.F.A. Alkemade (author), P. F.A. Alkemade (author), PFA Alkemade (author)

Helium Ion Beam Processing for Nanofabrication and Beam-Induced Chemistry

Journal article (2010) - PFA Alkemade (author), P. F.A. Alkemade (author), P.F.A. Alkemade (author), VA Sidorkin (author), P Chen (author), E.W.J.M. van der Drift (author), A. K. van Langen-Suurling (author), A. K. Van Langen-Suurling (author), A.K. Van Langen-Suurling (author), A.K. van Langen-Suurling (author), D Maas (author), E van Veldhoven (author)

Method for improving the aspect ratio of ultrahigh-resolution structures in negative electron-beam resist

Journal article (2009) - VA Sidorkin (author), PFA Alkemade (author), PFA Alkemade (author), P. F.A. Alkemade (author), P. F.A. Alkemade (author), P.F.A. Alkemade (author), P.F.A. Alkemade (author), H.W.M. Salemink (author), R. Schmits (author), E.W.J.M. van der Drift (author)

Resist thickness effects on ultra thin HSQ patterning capabilities

Journal article (2009) - VA Sidorkin (author), AE Grigorescu (author), H.W.M. Salemink (author), E.W.J.M. van der Drift (author)

Sub-10-nm nanolithography with a scanning helium beam

Journal article (2009) - VA Sidorkin (author), E van Veldhoven (author), E.W.J.M. van der Drift (author), PFA Alkemade (author), PFA Alkemade (author), P.F.A. Alkemade (author), P.F.A. Alkemade (author), P. F.A. Alkemade (author), P. F.A. Alkemade (author), H.W.M. Salemink (author), D Maas (author)

Towards 2-10 nm electron-beam lithography: a quantitative approach

Journal article (2008) - VA Sidorkin (author), A.J. van Run (author), A. K. van Langen-Suurling (author), A.K. van Langen-Suurling (author), A. K. Van Langen-Suurling (author), A.K. Van Langen-Suurling (author), AE Grigorescu (author), E.W.J.M. van der Drift (author)

Influence of HSQ resist exposure temperature on ultra-high resolution electron beam lithography

Journal article (2008) - VA Sidorkin (author), E.W.J.M. van der Drift (author), H.W.M. Salemink (author)