Resist and Exposure Processes for Sub-10-nm Electron and Ion Beam Lithography

Doctoral thesis (2010)

Authors

VA Sidorkin QN/Kavli Nanolab Delft - AS
Research Group
QN/Kavli Nanolab Delft (AS) (TU Delft)
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Published Date

2010

Language

Undefined/Unknown

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Faculty

Applied Sciences

Department

QN/Quantum Nanoscience

Research Group

QN/Kavli Nanolab Delft