Method for improving the aspect ratio of ultrahigh-resolution structures in negative electron-beam resist

Journal article (2009)

Authors

VA Sidorkin QN/Kavli Nanolab Delft
Paul F.A. Alkemade QN/Fysics of NanoElectronics, QN/Kavli Nanolab Delft
H.W.M. Salemink QN/Photronic Devices
R. Schmits External organisation
EWJM van der Drift QN/Kavli Nanolab Delft
Research Group
QN/Kavli Nanolab Delft
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Published Date

2009

Language

Undefined/Unknown

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Research Group

QN/Kavli Nanolab Delft

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