Towards 2-10 nm electron-beam lithography: a quantitative approach

Journal article (2008)

Authors

VA Sidorkin QN/Kavli Nanolab Delft - AS
A.J. van Run QN/Kavli Nanolab Delft - AS
A. K. van Langen-Suurling QN/Kavli Nanolab Delft - AS
AE Grigorescu ImPhys/Charged Particle Optics
E.W.J.M. van der Drift QN/Kavli Nanolab Delft - AS
Research Group
QN/Kavli Nanolab Delft (AS) (TU Delft)
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Published Date

2008

Language

Undefined/Unknown

Reuse Rights

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Faculty

Applied Sciences

Department

QN/Quantum Nanoscience

Research Group

QN/Kavli Nanolab Delft