Copper for IC-applications. Mechanical reliability of CVD copper films

Report (1996)

Authors

JF Jongste External organisation
JP Lokker QN/Fysics of NanoElectronics
G.C.A.M. Janssen OLD Metals Processing, Microstructures and Properties
S Radelaar OLD Metals Processing, Microstructures and Properties
Research Group
QN/Fysics of NanoElectronics
More Info
expand_more

Published Date

1996

Language

Undefined/Unknown

Reuse Rights

Other than for strictly personal use, it is not permitted to download, forward or distribute the text or part of it, without the consent of the author(s) and/or copyright holder(s), unless the work is under an open content license such as Creative Commons.

Research Group

QN/Fysics of NanoElectronics