Birefringe induced by the spatial dispersion in deep UV Lithography: Theory and advanced compensation strategy.

Journal article (2005)

Authors

A Serebriakov ImPhys/Optics - AS
E. Maksimov External organisation
F. Bociort ImPhys/Optics - AS
J.J.M. Braat ImPhys/Optics - AS
Research Group
ImPhys/Optics (AS) (TU Delft)
More Info
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Published Date

2005

Language

Undefined/Unknown

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Faculty

Applied Sciences

Department

ImPhys/Imaging Physics

Research Group

ImPhys/Optics