Influence of SiH2Cl2 on the kinetics of chemical vapor deposition of tungsten by SiH4 reduction of WF6.

Jongste, JF; Oosterlaken, TGM; Janssen, G.C.A.M.; Radelaar, S

Influence of SiH2Cl2 on the kinetics of chemical vapor deposition of tungsten by SiH4 reduction of WF6.

Journal article (1999)

Authors

JF Jongste External organisation

TGM Oosterlaken External organisation

G.C.A.M. Janssen OLD Metals Processing, Microstructures and Properties

S Radelaar OLD Metals Processing, Microstructures and Properties

Research Group

OLD Metals Processing, Microstructures and Properties

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Published Date

1999

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Research Group

OLD Metals Processing, Microstructures and Properties