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A Talneau
1 records found
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Cl-2/O-2- and Cl-2/N-2-based inductively coupled plasma etching of photonic crystals in InP: Sidewall passivation
Conference paper (2005) -
R van der Heijden
,
CF Carlstrom
,
E.W.J.M. van der Drift
,
RW van der Heijden
,
R Notzel
,
R Veldhoven
,
F Karouta
,
H.W.M. Salemink
,
A Talneau