Cl-2/O-2- and Cl-2/N-2-based inductively coupled plasma etching of photonic crystals in InP: Sidewall passivation

Conference paper (2005)

Authors

R van der Heijden External organisation
CF Carlstrom External organisation
E.W.J.M. van der Drift QN/Kavli Nanolab Delft - AS
RW van der Heijden External organisation
R Notzel External organisation
R Veldhoven External organisation
F Karouta External organisation
H.W.M. Salemink QN/Afdelingsbureau
A Talneau External organisation
Research Group
QN/Kavli Nanolab Delft (AS) (TU Delft)
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Published Date

2005

Language

Undefined/Unknown

Reuse Rights

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Faculty

Applied Sciences

Department

QN/Quantum Nanoscience

Research Group

QN/Kavli Nanolab Delft