Person | TU Delft Repository

FH

F. Huussen

2 records found

1

Authored

Simulation and validation of SiO2 LPCVD from TEOS in a vertical 300 mm multi-wafer reactor

Journal article (2002) - GJ Schoof, C.R. Kleijn, H.E.A. van den Akker, TGM Oosterlaken, H.J.M.C. Terhorst, F. Huussen

Simulation of SiO2 deposition in a vertical 300 mm LPCVD furnace

Conference paper (2002) - GJ Schoof, C.R. Kleijn, TGM Oosterlaken, F. Huussen, H.J.M.C. Terhorst