Simulation and validation of SiO2 LPCVD from TEOS in a vertical 300 mm multi-wafer reactor

Journal article (2002)

Authors

GJ Schoof Old - sect Kramers Laboratory (MSP/FT)
C.R. Kleijn Old - sect Kramers Laboratory (MSP/FT)
H.E.A. van den Akker Old - sect Kramers Laboratory (MSP/FT)
TGM Oosterlaken External organisation
H.J.M.C. Terhorst External organisation
F. Huussen External organisation
Research Group
Old - sect Kramers Laboratory (MSP/FT)
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Published Date

2002

Language

Undefined/Unknown

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Research Group

Old - sect Kramers Laboratory (MSP/FT)