Simulation and validation of SiO2 LPCVD from TEOS in a vertical 300 mm multi-wafer reactor

Schoof, GJ; Kleijn, C.R.; van den Akker, H.E.A.; Oosterlaken, TGM; Terhorst, H.J.M.C.; Huussen, F.

Simulation and validation of SiO2 LPCVD from TEOS in a vertical 300 mm multi-wafer reactor

Journal article (2002)

Authors

GJ Schoof Old - sect Kramers Laboratory (MSP/FT)

C.R. Kleijn Old - sect Kramers Laboratory (MSP/FT)

H.E.A. van den Akker Old - sect Kramers Laboratory (MSP/FT)

TGM Oosterlaken External organisation

H.J.M.C. Terhorst External organisation

F. Huussen External organisation

Research Group

Old - sect Kramers Laboratory (MSP/FT)

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Published Date

2002

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Research Group

Old - sect Kramers Laboratory (MSP/FT)