W

W Crans

16 records found

Parameter calibration on post-implantation dopant diffusion

Weer woord op het protocol van proposal DET 5788

Parameter calibration for dopant post-implant diffusion

Varying characteristics of bipolar transistors with emitter contact window width

Improving the speed performance of large scale TCAD simulators for microelectronics by multygrid and parallelisation - DEL 5672

Varying characteristics of bipolar transistors with emitter contact window width

Optimization of an integrated high power vertical PNP transistor

A robust implementation of stress governing equations for next generation process simulators
Conference paper (2001) - S Mijalkovic (author), W Crans (author)

The influence of mechanical stresses on the characteristics of bipolar transistors

Improving the performance of process simulators by multigrid (MG) methods and parallelisation

De DIMES cleanroom en zijn virtuele tegenhanger: een garantie voor baanbrekend, gevarieerd en diepgaand onderzoek aan geintegreerde circuits
Journal article (2000) - W Crans (author)

Improving the performance of process stimulators by multigrid (MG) methods and parallelisation. Half yearly report, working period: Jan. - June 2000 [confidential]

Comparison of numerical simulations and experimental results on ridge wave guide lasers

Comparison of numerical simulations and experimental results on ridge wave guide lasers

Improving the performance of process simulators by multigrid (MG) methods and parallelisation. Half-yearly report: January-June 1999 [vertrouwelijk]

Improving the performance of process simulators by multigrid (MG) methods and parallelisation. Annual report: September-December 1998 [vertrouwelijk]