In most optical waveguides employed within photonic integrated circuits, light confinement is achieved by etching the high-index layer. However, these waveguides often lack versatility in optimizing optical properties, such as mode size, shape, dispersion, and polarization. Moreover, they frequently suffer from high coupling losses and their propagation losses are significantly influenced by the quality of the etching process, especially for materials with high mechanical rigidity. Here, we present a hybrid optical waveguide concept that effectively addresses these limitations by combining a strip of easily processible low-index material (SU8) with a high-index hard-to-etch guiding layer (amorphous silicon carbide, SiC). Our approach not only eliminates the need for SiC etching but also offers flexibility in waveguide design to accommodate advanced functionalities. One of the key advancements of this hybrid configuration is its ability to suppress the transverse magnetic mode by 62 dB at 1550 nm, effectively functioning as a transverse electric pass waveguide. This simplifies the measurements by eliminating the need for polarization controllers and polarizers. Furthermore, through tailored waveguides, we achieve 2.5 times higher coupling efficiency compared to untapered hybrid SiC waveguides. We also demonstrate that thermal baking of the polymer layer reduces the scattering losses from 1.57 to 1.3 dB/cm. In essence, our hybrid approach offers a versatile way of realizing low-loss SiC-based integrated optical components with advanced features, such as excellent polarization suppression, flexible mode shapes, and dispersion control, compared to etched counterparts.@en