A quantitative evaluation of pattern transfer across (111) surfaces in a (100) silicon wafer by contact masking and over-exposure

Venstra, Warner; Laros, M; Spronck, Jo; Sarro, Lina; Eijk, J.

A quantitative evaluation of pattern transfer across (111) surfaces in a (100) silicon wafer by contact masking and over-exposure

Conference paper (2004)

Authors

Warner Venstra Mechatronic Systems Design - Mechanical, Maritime and Materials Engineering

M Laros Electronic Components, Technology and Materials -

Jo Spronck Mechatronic Systems Design - Mechanical, Maritime and Materials Engineering

Lina Sarro Electronic Components, Technology and Materials -

J. Eijk External organisation

Research Group

Mechatronic Systems Design (Mechanical, Maritime and Materials Engineering) (TU Delft)

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Published Date

2004

Language

Undefined/Unknown

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Faculty

Mechanical, Maritime and Materials Engineering

Department

Precision and Microsystems Engineering

Research Group

Mechatronic Systems Design