Predicted effect of shot noise on contact hole dimension in e-beam lithography

Kruit, P; Steenbrink, S.; Wieland, M.J.J.

Predicted effect of shot noise on contact hole dimension in e-beam lithography

Journal article (2006)

Authors

P Kruit ImPhys/Charged Particle Optics

S. Steenbrink External organisation

M.J.J. Wieland External organisation

Research Group

ImPhys/Charged Particle Optics

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Published Date

2006

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Research Group

ImPhys/Charged Particle Optics

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