Dry etching of SiC in inductively coupled Cl-2/Ar plasma

Journal article (2004)

Authors

LD Jiang External organisation
NOV Plank External organisation
MA Blauw QN/Kavli Nanolab Delft - AS
R Cheung External organisation
E.W.J.M. van der Drift QN/Kavli Nanolab Delft - AS
Research Group
QN/Kavli Nanolab Delft (AS) (TU Delft)
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Published Date

2004

Language

Undefined/Unknown

Reuse Rights

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Faculty

Applied Sciences

Department

QN/Quantum Nanoscience

Research Group

QN/Kavli Nanolab Delft