Closed loop thermal control of a lithographic optical component

Conference paper (2012)

Authors

R. Saathof Mechatronic Systems Design
A. Haber Team Michel Verhaegen
J.W. Spronck Mechatronic Systems Design
Michel Verhaegen Team Michel Verhaegen
Robert Munnig Schmidt Mechatronic Systems Design
Research Group
Mechatronic Systems Design
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Published Date

2012

Language

English

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Research Group

Mechatronic Systems Design

Abstract

In EUV lithography the high throughput and high absorption can cause thermal deformation of the mirrors, which induces image distortion. In a previous paper [1] we have presented an actuation mechanism that is suitable to compensate and correct for these thermal aberrations. In this paper we present a closed-loop control strategy to apply it on this actuation mechanism and its application on an experimental set-up.

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