Closed loop thermal control of a lithographic optical component

Conference paper (2012)

Authors

R. Saathof Mechatronic Systems Design - Mechanical, Maritime and Materials Engineering
A. Haber Team Michel Verhaegen - Mechanical, Maritime and Materials Engineering
J.W. Spronck Mechatronic Systems Design - Mechanical, Maritime and Materials Engineering
M.H.G. Verhaegen Team Michel Verhaegen - Mechanical, Maritime and Materials Engineering
R.H. Munnig Schmidt Mechatronic Systems Design - Mechanical, Maritime and Materials Engineering
Research Group
Mechatronic Systems Design (Mechanical, Maritime and Materials Engineering) (TU Delft)
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Published Date

2012

Language

English

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Faculty

Mechanical, Maritime and Materials Engineering

Department

Precision and Microsystems Engineering

Research Group

Mechatronic Systems Design

Abstract

In EUV lithography the high throughput and high absorption can cause thermal deformation of the mirrors, which induces image distortion. In a previous paper [1] we have presented an actuation mechanism that is suitable to compensate and correct for these thermal aberrations. In this paper we present a closed-loop control strategy to apply it on this actuation mechanism and its application on an experimental set-up.