Analysis of the Inter-Stage Signal Leakage in Wide BW Low OSR and High DR CT MASH ΔΣM

Conference paper (2020)

Authors

Qilong Liu Eindhoven University of Technology
Lucien Breems Eindhoven University of Technology, NXP Semiconductors
S Bajoria NXP Semiconductors
M. Bolatkale NXP Semiconductors, Electronic Instrumentation - EEMCS
Chenming Zhang NXP Semiconductors
Georgi Radulov Eindhoven University of Technology
Research Group
Electronic Instrumentation (EEMCS) (TU Delft)
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Published Date

2020

Language

English

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Faculty

Electrical Engineering, Mathematics and Computer Science

Department

Microelectronics

Research Group

Electronic Instrumentation

Abstract

This paper analyzes the error mechanisms that limit the dynamic range (DR) of wide-bandwidth, low-OSR continuous-time (CT) multi-stage noise-shaping (MASH) ΔΣM and proposes a tool, the Signal Leakage Function (SLF), to optimize the architecture, and hence improving DR. The SLF provides new insights on finding the key parameters which influence the inter-stage signal leakage and thus the inter-stage gain (IG). These insights would lead not only to increasing the overall dynamic range in a very power-efficient way, but also decreasing the performance sensitivity to mismatches and other variations.

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