A novel method to prevent pattern rotation in anisotropic wet etch

Shen, C.; Pham, HTM; Dekker, R.; Sarro, Pasqualina M

A novel method to prevent pattern rotation in anisotropic wet etch

Conference paper (2008)

Authors

C. Shen Electronic Components, Technology and Materials -

HTM Pham Old - EWI Sect. ECTM

R. Dekker Electronic Components, Technology and Materials -

Pasqualina M Sarro Electronic Components, Technology and Materials -

Research Group

Electronic Components, Technology and Materials () (TU Delft)

To reference this document use:

http://resolver.tudelft.nl/uuid:84733c0d-fbfa-425e-986b-c680c587ae2b

More Info

expand_more

Published Date

2008

Language

Undefined/Unknown

Reuse Rights

Other than for strictly personal use, it is not permitted to download, forward or distribute the text or part of it, without the consent of the author(s) and/or copyright holder(s), unless the work is under an open content license such as Creative Commons.

Faculty

Electrical Engineering, Mathematics and Computer Science

Department

Microelectronics

Research Group

Electronic Components, Technology and Materials