Pure boron chemical vapor deposited layers; A new material for silicon device processing

Nanver, LK; Scholtes, T.L.M.; Sarubbi, F; de Boer, Wiebe; Lorito, G.; Sakic, A.; Milosavljević, S.; Mok Kai Rine, C.; Shi, Lei; Nihtianova, Stoyan; Buisman, K.

Pure boron chemical vapor deposited layers; A new material for silicon device processing

Conference paper (2010)

Authors

LK Nanver Electronic Components, Technology and Materials

T.L.M. Scholtes Electronic Components, Technology and Materials

F Sarubbi Electronic Components, Technology and Materials

Wiebe de Boer Electronic Components, Technology and Materials

G. Lorito Electronic Components, Technology and Materials

A. Sakic Electronic Components, Technology and Materials

S. Milosavljević Electronic Components, Technology and Materials

C. Mok Kai Rine Electronic Components, Technology and Materials

Lei Shi Electronic Instrumentation

Stoyan Nihtianova Electronic Instrumentation

K. Buisman Old - EWI Sect. Electronics

Research Group

Electronic Components, Technology and Materials

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Published Date

2010

Language

English

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Research Group

Electronic Components, Technology and Materials

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