Temperature influence on etching deep holes with SF6/O2 cryogenic plasma

Journal article (2002)

Authors

G Craciun Electronic Instrumentation
MA Blauw QN/Kavli Nanolab Delft
E.W.J.M. van der Drift QN/Kavli Nanolab Delft
Pasqualina M Sarro Electronic Components, Technology and Materials
Patrick J. French Electronic Instrumentation
Research Group
Electronic Instrumentation
More Info
expand_more

Published Date

2002

Language

Undefined/Unknown

Reuse Rights

Other than for strictly personal use, it is not permitted to download, forward or distribute the text or part of it, without the consent of the author(s) and/or copyright holder(s), unless the work is under an open content license such as Creative Commons.

Research Group

Electronic Instrumentation

No files available

Metadata only record. There are no files for this journal article.